Axus: ONTRAK DSS-200 SERIES 0 POST CMP CLEANER

ONTRAK DSS-200 SERIES 0

OnTrak DSS 200 Series 0 Double-sided PVA Scrubber is designed to clean wafers using options for a variety of chemical processes, including, but not limited to Post-CMP cleaning.

Standard Features Include:

Universal Load Station
Double Sided PVA Scrub
Dual Brush Boxes
Ammonia Dispense
IR Assisted Spin Dry Station
Robotic Unload
Vertical Unload Station

Optional Features:

Megasonics at spin dry station
Wafer size kits for 100 to 200mm
Signal Light Tower

Process Applications

The DSS-200 Series 0 is a proven, cost-effective cleaning system for the following applications:

Post-Chemical-Mechanical Polishing (CMP) Cleaning: Oxide, Polysilicon, Nitride, Tungsten, Aluminum and Copper
General purpose cleaning: post-CVD oxides, post-metallization, surface topography cleaning, trench cleaning
Silicon cleaning: prime silicon, reclaim silicon, fab monitor reclaim

System Configuration

Using an in-line, single-wafer processing platform, the DSS-200 Series 0 can process wafers at high throughput rates. Typical processes run from 41 to 60 wafers per hour, depending on the application.

The system is configured with a wet spray load station, two dual-sided brush modules, a spin/rinse/dry module and an unload handler assembly. The optional submergible load station keeps wafers immersed in DI water while waiting for processing.

As the wafer passes through each process module, the top and bottom surfaces are sprayed with DI water. Constant flowing of the process water allows the brushes to flush continuously during both process and idle modes. Throughout the entire DI water plumbing system, the DSS-200 allows for constant drip flows when wafers are not being processed. The system has no water “dead legs” in the plumbing.

In the spin station module, wafers are spun, rinsed, and dried. By using a heat lamp assembly, 200mm wafers are spun dry in under 15 seconds at <2000 rpm.

By including the optional Megasonic Sweep Assembly, the process engineer now has the ability to clean difficult wafer topographies and metal surfaces.

Maintenance functions allow trained personnel access to all hardware operations inside the control system for fast, easy troubleshooting.

Contact Axus Technology or your local Axus Technology Sales Representative to discuss how Axus can help you get the most from your equipment investment.

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