POLI-762 CMP Tool
The G & P Technology POLI-762 Membrane Carrier CMP Tool is our most advanced and intelligent CMP tool designed for high versatility for 12”(300mm) CMP process development, materials evaluation and pre-production runs. The POLI-762 was also designed for advanced wafer manufactures and consumables suppliers.
Standard Features Include: 
- Carrier Size, 300mm
- Optional Sizes, 4”, 150mm, 200mm
- Platen Speed, 30 – 200rpm
- Carrier Speed, 20 – 300rpm
- In Situ Pad Conditioner
- Slurry Pumps, 4
- Platen temperature control
Options:
- End Point Detection, motor current
- Low pressure polish control
- High pressure spray rinse